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A DFM tool for analyzing lithography and stress effects on standard cells and critical path performance in 45nm digital designs.
Rami F. Salem
Abdelrahman ElMously
Haitham Eissa
Mohamed Dessouky
Mohab H. Anis
Published in:
IDT (2010)
Keyphrases
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critical path
job shop scheduling problem
neural network
artificial intelligence
design parameters