Lithography Options for the 32 nm Half Pitch Node and Beyond.

Kurt Ronse Philippe Jansen Roel Gronheid Eric Hendrickx Mireille Maenhoudt Vincent Wiaux Mieke Goethals R. Jonckheere Geert Vandenberghe

Published in: IEEE Trans. Circuits Syst. I Regul. Pap. (2009)

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