Use of neural network to in situ conditioning of semiconductor plasma processing equipment.
Byungwhan KimDaehyun KimPublished in: Appl. Soft Comput. (2012)
Keyphrases
- neural network
- plasma etching
- real time
- artificial neural networks
- neural network model
- information systems
- thin film
- data processing
- genetic algorithm
- fault diagnosis
- self organizing maps
- hybrid neural network
- neural network is trained
- training algorithm
- pattern recognition
- information processing
- feedforward neural networks
- neural model
- learning vector quantization
- auto associative
- feed forward neural networks
- semiconductor manufacturing
- processing capabilities
- multi layer
- neural nets
- back propagation