E-BLOW: e-beam lithography overlapping aware stencil planning for MCC system.

Bei Yu Kun Yuan Jhih-Rong Gao David Z. Pan

Published in: DAC (2013)

Keyphrases

electron beam
electron beam lithography
planning problems
heuristic search
information retrieval
decision support
motion planning
data sets
databases
image processing
data structure
search algorithm
ai planning