Plasma-Induced Fluorine Damage in P-HEMT Caused by C2F6/CHF3 RIE Plasma.

Hiroyuki Uchiyama Takafumi Taniguchi

Published in: IEICE Electron. Express (2004)

Keyphrases

thin film
high energy
scanning electron microscope
high density
real world
plasma etching
object recognition
electric field
pairwise