Sign in
Process Development for Very Deep Etching of Silicon Using Two Layer Masks for Fabrication of Mechanically Decoupled MEMS Gyroscope.
Deepak K. Sharma
J. John
G. Supriya
Ashwini Jambhalikar
M. S. Giridhar
Published in:
VDAT (2021)
Keyphrases
</>
development process
high density
plasma etching
computer vision
image processing
high speed
information systems
case study
low cost
information processing
design process