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Device Technology for embedded DRAM utilizing stacked MIM(Metal-Insulator-Metal) Capacitor.

Yasushi YamagataHiroki ShiraiHirotoshi SugimuraS. AraiTomoko WakeKen InoueTakashi SakohMasato SakaoTakaho Tanigawa
Published in: CICC (2006)
Keyphrases
  • high temperature
  • field effect transistors
  • metal oxide semiconductor
  • metal oxide
  • high density
  • cost effective
  • data processing
  • computer systems
  • integrated circuit
  • data structure
  • bitstream