Sign in

A study on flare minimisation in EUV lithography by post-layout re-allocation of wire segments.

Sudipta PaulPritha BanerjeeSusmita Sur-Kolay
Published in: IET Circuits Devices Syst. (2021)
Keyphrases
  • user interface
  • experimental study
  • information retrieval
  • learning algorithm
  • information systems
  • theoretical framework
  • study proposes
  • equal length