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Fast and accurate proximity effect correction algorithm based on pattern edge shape adjustment for electron beam lithography.
Wenze Yao
Hongcheng Xu
Haojie Zhao
Ming Tao
Jie Liu
Published in:
Microelectron. J. (2023)
Keyphrases
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contour fragments
pattern matching
electron beam lithography
high accuracy
multiscale
computationally efficient
computer vision
image processing
case study
three dimensional
high quality
object recognition
fuzzy sets
shape features
control algorithm