The aligned Si nanowires growth using MW plasma enhanced CVD.

N. N. Dzbanovsky V. V. Dvorkin V. G. Pirogov N. V. Suetin

Published in: Microelectron. J. (2005)

Keyphrases

plasma etching
chemical vapor deposition
power consumption
thin film
high density
decision support system
high energy
neural network
knowledge base
data structure
video sequences
information technology
electric field