Strain and layout management in dual channel (sSOI substrate, SiGe channel) planar FDSOI MOSFETs.
François AndrieuMikaël CasséE. BaylacP. PerreauO. NierDenis RideauR. BerthelonFranck PourchonA. PofelskiB. De SalvoC. GallonVincent MazzocchiD. BargeC. GaumerO. GourhantA. CrosV. BarralRossella RanicaNicolas PlanesWalter SchwarzenbachE. RichardEmmanuel JosseOlivier WeberFranck ArnaudMaud VinetOlivier FaynotM. HaondPublished in: ESSDERC (2014)