Feasible approach for processes integration of CMOS transistor gate/side-wall spacer patterning fabrication.
Chun-Jen WengPublished in: Microelectron. Reliab. (2010)
Keyphrases
- integrated circuit
- high speed
- metal oxide semiconductor
- low power
- cmos technology
- electron beam
- circuit design
- power dissipation
- low cost
- high density
- process management
- neural network
- field effect transistors
- silicon dioxide
- information integration
- data integration
- transmission line
- focal plane
- analog vlsi
- semiconductor devices
- floating gate
- nano scale