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Fabrication of Less than 20-nm-Diameter Nanodot Arrays Using Inorganic Electron Beam Resist and Post Exposure Bake.

Jun TaniguchiTetsuro ManabeKiyoshi Ishikawa
Published in: Int. J. Autom. Technol. (2011)
Keyphrases
  • electron beam lithography
  • electron beam
  • integrated circuit
  • x ray
  • design parameters
  • semiconductor devices
  • real time
  • real world
  • genetic algorithm
  • case study
  • decision problems
  • dynamic model