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Lithography-aware layout modification considering performance impact.

Hongbo ZhangYuelin DuMartin D. F. WongKai-Yuan Chao
Published in: ISQED (2011)
Keyphrases
  • preprocessing
  • electron beam
  • real time
  • metadata
  • website
  • natural language
  • control system
  • factors influencing
  • main factors