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An integrated and improved dispatching approach to reduce cycle time of wet etch and furnace operations in semiconductor fabrication.
Chia-Yu Chang
Kuo-Hao Chang
Published in:
CSCWD (2012)
Keyphrases
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semiconductor devices
high density
integrated circuit
plasma etching
semiconductor manufacturing
manufacturing process
manufacturing systems
high speed
information systems
neural network
data center
data sets
significantly reduced
database systems
production scheduling
flow rate
machine learning