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Comparison among Silicon modulators based on Free-Carrier Plasma Dispersion Effect.

Diego Pérez-GalachoDelphine Marris-MoriniEric CassanCharles BaudotJean-Marc FedeliSegolene OlivierFrédéric BoeufLaurent Vivien
Published in: ICTON (2015)
Keyphrases
  • high density
  • plasma etching
  • low cost
  • high speed
  • database
  • neural network
  • real world
  • data mining
  • image processing
  • artificial neural networks
  • chemical vapor deposition