Impact of stress on various circuit characteristics in 65nm PDSOI technology.
Sushant SuryagandhMayank GuptaZhiyuan WuSrinath KrishnanMario PelellaJung-Suk GooCiby ThuruthiyilJudy X. AnBrian Q. ChenNiraj SubbaLuis ZamudioJames YonemuraAli B. IcelPublished in: ESSCIRC (2007)