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Electrical Performance and Stability Improvement of p-Channel SnO Thin-Film Transistors Using Atomic-Layer-Deposited Al₂O₃ Capping Layer.

Kang-Hwan BaeMin Gyu ShinSeong-Hyun HwangHwan-Seok JeongDae-Hwan KimHyuck-In Kwon
Published in: IEEE Access (2020)
Keyphrases
  • thin film
  • multi layer
  • application layer
  • high density
  • electron microscopy
  • short circuit
  • expert systems
  • chemical vapor deposition