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Analysis of the effects of reflectance and refraction generated by wafers made from fused silica, ALOxNy and TiSixNy under different light sources on pattern length and best focus.
Yang-Kuao Kuo
Chuen-Guang Chao
Published in:
Microelectron. J. (2005)
Keyphrases
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light source
single image
photometric stereo
shape from shading
multi view
object surface
reflectance properties
multiple light sources