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Influence of hydrogen dilution and substrate temperature on growth of nanocrystalline hydrogenated silicon carbide films deposited by RF sputtering.
Malek Madani
H. Colder
X. Portier
K. Zellama
R. Rizk
H. Bouchriha
Published in:
Microelectron. J. (2006)
Keyphrases
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rf sputtering
magnetic field
chemical vapor deposition
low cost
high density
neural network
special case
thin film