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Influence of hydrogen dilution and substrate temperature on growth of nanocrystalline hydrogenated silicon carbide films deposited by RF sputtering.

Malek MadaniH. ColderX. PortierK. ZellamaR. RizkH. Bouchriha
Published in: Microelectron. J. (2006)
Keyphrases
  • rf sputtering
  • magnetic field
  • chemical vapor deposition
  • low cost
  • high density
  • neural network
  • special case
  • thin film