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Effect of oxygen pressure on the semiconductor properties of FTO thin films.

Ali HamiehJihad HamiehAli HamieAli GhorayebAbdallah ZaiourBassam Assaf
Published in: ICM (2017)
Keyphrases
  • thin film
  • plasma etching
  • grain size
  • databases
  • high density
  • semiconductor manufacturing
  • database
  • artificial neural networks
  • multi layer
  • low density
  • room temperature