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Fabrication of high performance AlGaN/GaN FinFET by utilizing anisotropic wet etching in TMAH solution.

Dong-Hyeok SonYoung-woo JoRyun-Hwi KimChan HeoJae Hwa SeoJin Su KimIn Man KangSorin CristoloveanuJung-Hee Lee
Published in: ESSDERC (2015)
Keyphrases
  • integrated circuit
  • optimal solution
  • high density
  • linear equations
  • plasma etching
  • data sets
  • image sequences
  • multiresolution
  • anisotropic diffusion