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Fabrication of ring-shaped silicon resonator using (2, 1) in-plane resonance mode.

Kenta SuzukiKumiko IokaYasushiro Nishioka
Published in: NEMS (2011)
Keyphrases
  • high density
  • plasma etching
  • high speed
  • semiconductor devices
  • integrated circuit
  • three dimensional
  • low density
  • silicon on insulator
  • low cost
  • ground plane
  • electron beam
  • data center