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A novel hierarchical approach for proximity effect correction in electron beam lithography.

Kenji HarafujiAkio MisakaNoboru NomuraMasahiro KawamotoHirohiko Yamashita
Published in: IEEE Trans. Comput. Aided Des. Integr. Circuits Syst. (1993)
Keyphrases
  • electron beam lithography
  • electron beam
  • x ray
  • real world
  • error correction
  • hierarchical model
  • artificial intelligence
  • knowledge base
  • pairwise
  • multiresolution
  • hierarchical structure
  • coarse to fine
  • error analysis