Organosilicon-Based Thin Film Formation in Very High-Frequency Plasma Under Atmospheric Pressure.
Afif HamzensKento KitamuraShota MochizukiLeapheng UonHiromasa OhmiHiroaki KakiuchiPublished in: Int. J. Autom. Technol. (2023)
Keyphrases
- thin film
- high frequency
- low frequency
- plasma etching
- chemical vapor deposition
- visual quality
- high resolution
- high density
- short circuit
- wavelet transform
- high frequencies
- multi layer
- low pass
- subband
- discrete wavelet transform
- neural network
- wavelet coefficients
- room temperature
- white light interferometry
- high frequency components
- image data
- frequency band
- wavelet domain
- low cost
- image registration
- computational complexity
- machine learning