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A Novel Fabrication of PDMS Chip using Atmospheric Pressure Plasma Jet: Hydrophobicity Modification and Feasibility Test.
Ya-Shen Yu
Lih-Hwa Kuo
Mu-Chien Wu
Jong-Shinn Wu
Chia-Hung Dylan Tsai
Published in:
IROS (2018)
Keyphrases
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high density
high speed
low density
plasma etching
analog vlsi
low cost
data center
chemical vapor deposition
thin film
fluid flow