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Study on the RF Sputtered hydrogenated amorphous silicon-germanium thin films.

M. SerényiJ. BetkoÁkos NemcsicsN. Q. KhanhD. K. BasaM. Morvic
Published in: Microelectron. Reliab. (2005)
Keyphrases
  • thin film
  • high density
  • data streams
  • chemical vapor deposition
  • neural network
  • high speed
  • plasma etching