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Influence of substrate temperature to prepare (1 0 3) oriented AlN films.
Maw-Shung Lee
Sean Wu
Shih-Bin Jhong
Kuan-Ting Liu
Ruyen Ro
Chia-Chi Shih
Zhi-Xun Lin
Kang-I Chen
Shou-Chang Cheng
Published in:
Microelectron. Reliab. (2010)
Keyphrases
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rf sputtering
film thickness
magnetic field
thin film
electrical properties
chemical vapor deposition
heat flow
databases
room temperature
factors influencing
refractive index
data sets
x ray
social influence
permalloy films