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Simultaneous Subthreshold and Gate-Oxide Tunneling Leakage Current Analysis in Nanometer CMOS Design.
Dongwoo Lee
Wesley Kwong
David T. Blaauw
Dennis Sylvester
Published in:
ISQED (2003)
Keyphrases
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leakage current
low voltage
silicon dioxide
design considerations
circuit design
real time
cost effective
electron microscopy
cmos technology
chip design