A Systematic Study of HCI Improvement in FinFET with Source/Drain Implant and Geometry Modulation.
Rakesh RanjanPavitra R. PerepaKi-Don LeeAshish Kumar JhaKartika C. SahooKayla N. SandersRobert MoellerPrateek SharmaMinhyo KangPeter KimKwanjae SongYongwoo JeonSeungho KimHyewon ShimShin-Young ChungJu Kwang KimPublished in: IRPS (2024)