Fabrication of superhydrophobic wide-band "Black Silicon" by deep reactive ion etching.

Tian-Le Gao Xiao-Sheng Zhang Guang-Yi Sun Haixia Zhang

Published in: NEMS (2011)

Keyphrases

wide band
plasma etching
thin film
high density
integrated circuit
low density
magnetic recording
low light
received signal
slowly varying
high speed
multiresolution
denoising
field effect transistors