Effective work function engineering by sacrificial lanthanum diffusion on HfON-based 14 nm NFET devices.
Carlos Suarez-SegoviaCharles LerouxFlorian DomengieKaren DabertrandVincent JosephGiovanni RomanoPierre CaubetStephane ZollOlivier WeberGérard GhibaudoGilles ReimboldMichel HaondPublished in: ESSDERC (2015)