Fabrication of metal embedded photo-mask for sub-micrometer scaled photolithography and patterning sapphire substrate.
Jhih-Nan YanYung-Chun LeePublished in: NEMS (2012)
Keyphrases
- integrated circuit
- field effect transistors
- semiconductor devices
- high density
- magnetic recording
- steady state
- mathematical analysis
- manufacturing systems
- electron beam
- embedded systems
- computer simulation
- database
- petri net
- high speed
- multi agent systems
- digital photos
- digital photographs
- databases
- data sets
- real time