Double-side exposure UV-LED CNC lithography for fine 3D microfabrication.

Jungkwun J. K. Kim Yong-Kyu Yoon Mark G. Allen

Published in: NEMS (2017)

Keyphrases

electron beam lithography
electron beam
coarse to fine
x ray
machining processes
data sets
case study
environmental factors
high dynamic range imaging
feature selection
multiresolution