On the Effect of Cationic Surfactants in the Rinse to Reduce Pattern Collapse in High Aspect Ratio Patterning of Photoresists.
Karina GrundkeAstrid DrechslerNicole PetongCornelia BellmannManfred StammOdo WunnickeJens ReicheltIris MägeB. PinterT. PearceM. VoigtPublished in: ICMENS (2005)