Login / Signup
Gradient-Based Source Mask Optimization for Extreme Ultraviolet Lithography.
Xu Ma
Zhiqiang Wang
Xuanbo Chen
Yanqiu Li
Gonzalo R. Arce
Published in:
IEEE Trans. Computational Imaging (2019)
Keyphrases
</>
global optimization
optimization problems
optimization process
artificial intelligence
optimization algorithm
constrained optimization
data sets
databases
neural network
evolutionary algorithm
optimization method
optimization methods
joint optimization
electron beam lithography