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A parametric study of ICP-RIE etching on a lithium niobate substrate.

Chun-Ming ChangChih-Sheng YuFan-Chun HsiehChun-Ting LinTsung-Tao HuangPing-Hung LinJiann-Shiun KaoChien-Nan HsiaoMing-Hua Shiao
Published in: NEMS (2015)
Keyphrases
  • artificial intelligence
  • statistical analysis
  • multiscale
  • theoretical framework
  • genetic algorithm
  • computer vision
  • three dimensional
  • range images
  • parametric models