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Benefit of Al2O3/HfO2 bilayer for BEOL RRAM integration through 16kb memory cut characterization.

M. AzzazA. BenoistElisa VianelloDaniele GarbinEric JalaguierCarlo CagliC. CharpinStefania BernasconiSimon JeannotT. DewolfG. AudoitC. GuedjS. DenormePhilippe CandelierClaire Fenouillet-BérangerLuca Perniola
Published in: ESSDERC (2015)
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