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Development and Evaluation of Ferrite Core Inductively Coupled Plasma Radio Frequency Ion Source for High-Current Ion Implanters in Semiconductor Applications.
Jong-Jin Hwang
Hyo-Jun Sim
Seung-Jae Moon
Published in:
Sensors (2024)
Keyphrases
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radio frequency
high energy
radio frequency identification
image processing
high quality
ubiquitous computing
rfid reader
plasma etching