Fabrication of Sub-100-nm silicon nanowire devices on SOI wafer by CMOS compatible fabrication process.

L. N. Sun T. M. H. Lee Z. C. Yang G. Z. Yan

Published in: NEMS (2010)

Keyphrases

silicon on insulator
cmos technology
high density
ibm power processor
integrated circuit
high speed
semiconductor devices
metal oxide semiconductor
real time
power consumption