Electromigration-induced failure in operando characterization of 3D interconnects: microstructure influence.
Simon GousseauStéphane MoreauDavid BouchuAlexis FarcyPierre MontmitonnetKarim InalFrançois BayMarc ZelsmannEmmanuel PicardMathieu SalaünPublished in: Microelectron. Reliab. (2015)