Remaining Useful Life Estimation of Lenses for an Ion Beam Etching Tool in Semiconductor Manufacturing Using Deep Convolutional Neural Networks.
Jian WanSeán F. McLoonePublished in: CECNet (2023)
Keyphrases
- semiconductor manufacturing
- convolutional neural networks
- process control
- discrete event simulation
- data sets
- multiresolution
- integrated circuit
- imaging systems
- thin film
- convolutional network
- real time
- production system
- robust estimation
- estimation process
- electron beam
- coarse to fine
- expert systems
- artificial intelligence
- plasma etching