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The influence of nitrogen and fluorine on the dielectric constant of hydrogenated amorphous carbon (a-C: H) films.

M. GuerinoMarcos MassiRonaldo Domingues Mansano
Published in: Microelectron. J. (2007)
Keyphrases
  • carbon dioxide
  • dielectric constant
  • simulation software
  • electric field
  • thin film
  • viewpoint
  • high frequency
  • microstrip