Login / Signup
The influence of nitrogen and fluorine on the dielectric constant of hydrogenated amorphous carbon (a-C: H) films.
M. Guerino
Marcos Massi
Ronaldo Domingues Mansano
Published in:
Microelectron. J. (2007)
Keyphrases
</>
carbon dioxide
dielectric constant
simulation software
electric field
thin film
viewpoint
high frequency
microstrip