Login / Signup

A Uniform Pressure Apparatus for Micro/Nanoimprint Lithography Equipment.

Jian-Shian LinChieh-Lung LaiYa-Chun TuCheng-Hua WuYoshimi Takeuchi
Published in: Int. J. Autom. Technol. (2009)
Keyphrases
  • electron beam
  • virtual instrument
  • data mining
  • decision making
  • objective function
  • data structure
  • preprocessing
  • pairwise
  • electron beam lithography
  • electro mechanical systems