Scaling equations for the accurate prediction of CMOS device performance from 180 nm to 7 nm.
Aaron StillmakerBevan M. BaasPublished in: Integr. (2017)
Keyphrases
- metal oxide semiconductor
- silicon on insulator
- cmos technology
- low cost
- prediction accuracy
- nm technology
- prediction model
- high accuracy
- high speed
- power consumption
- highly accurate
- integrated circuit
- image sensor
- prediction error
- ibm power processor
- transmission electron microscopy
- prediction algorithm
- real time
- high quality