CMOS-MEMS technology with front-end surface etching of sacrificial SiO2 dedicated for acoustic devices.
J. EstevesLibor RuferS. BasrourD. EkeomPublished in: IWASI (2013)
Keyphrases
- consumer electronics
- electronic devices
- high speed
- three dimensional
- d objects
- low cost
- low power
- silicon dioxide
- cmos technology
- input device
- high end
- mobile devices
- personal computer
- case study
- surface reconstruction
- power consumption
- communication technologies
- embedded systems
- remote control
- steady state
- silicon on insulator