Process variation dependence of total ionizing dose effects in bulk nFinFETs.
Bo LiYunbo HuangLing YangQingzhu ZhangZhongshan ZhengBinhong LiHuiping ZhuJianhui BuHuaxiang YinJiajun LuoZhengsheng HanHaibin WangPublished in: Microelectron. Reliab. (2018)