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Methodology for Standard Cell Compliance and Detailed Placement for Triple Patterning Lithography.
Bei Yu
Xiaoqing Xu
Jhih-Rong Gao
Yibo Lin
Zhuo Li
Charles J. Alpert
David Z. Pan
Published in:
IEEE Trans. Comput. Aided Des. Integr. Circuits Syst. (2015)
Keyphrases
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