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Electromigration behavior of dual-damascene Cu interconnects--Structure, width, and length dependences.
A. V. Vairagar
S. G. Mhaisalkar
Ahila Krishnamoorthy
Published in:
Microelectron. Reliab. (2004)
Keyphrases
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integrated circuit
information systems
real world
information retrieval
data mining
hierarchical structure
structural information
fixed length
behavior analysis
behavior patterns