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Reliability issues of silicon LSIs facing 100-nm technology node.

Eiji TakedaEiichi MurakamiKazuyoshi ToriiYutaka OkuyamaEishi EbeKenji HinodeShin'ichiro Kimura
Published in: Microelectron. Reliab. (2002)
Keyphrases
  • nm technology
  • low cost
  • high density
  • high speed
  • key issues
  • pattern recognition
  • image analysis
  • tree structure
  • steady state
  • power consumption
  • efficient implementation
  • massively parallel
  • space charge